Supplément au Journal de Physique Colloques

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FUNDAMENTALS OF THE PLASMA INDUCED AND ASSISTED CVD : PLASMA PARAMETERS CONTROLLING THE CHEMICAL EQUILIBRIUM, THE DEPOSITION KINETICS AND THE PROPERTIES OF THE FILMS

S. VEPEK

J. Phys. Colloques, 50 C5 (1989) C5-617-C5-635

DOI: 10.1051/jphyscol:1989573

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