Supplément au Journal de Physique Colloques

CHEMICAL VAPOR DEPOSITION OF TaSi₂ AND WSi₂ AT ATMOSPHERIC PRESSURE FROM IN SITU PREPARED METAL CHLORIDES

E. BLANQUET, C. VAHLAS, C. BERNARD, R. MADAR, J. PALLEAU and J. TORRES

J. Phys. Colloques, 50 C5 (1989) C5-557-C5-563

DOI: 10.1051/jphyscol:1989565

E. BLANQUET

C. VAHLAS

C. BERNARD

R. MADAR

J. PALLEAU

J. TORRES

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