Supplément au Journal de Physique Colloques

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LOW PRESSURE CHEMICAL VAPOR DEPOSITION (CVD) ON OXIDE AND NONOXIDE CERAMIC CUTTING TOOLS

A. LAYYOUS and R. WERTHEIM

J. Phys. Colloques, 50 C5 (1989) C5-423-C5-432

DOI: 10.1051/jphyscol:1989552

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