Supplément au Journal de Physique Colloques

PROCESS CHARACTERISATION FOR LPCVD DEPOSITION OF SiO₂ FILMS FROM TEOS LIQUID SOURCE

S. ROJAS, P. SERRA, W.S. WU, F. SANTARELLI, G.C. SARTI and F. MINNI

J. Phys. Colloques, 50 C5 (1989) C5-83-C5-90

DOI: 10.1051/jphyscol:1989513

S. ROJAS

P. SERRA

W.S. WU

F. SANTARELLI

G.C. SARTI

F. MINNI

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)