CHEMICAL VAPOR DEPOSITION OF TaSi2 AND WSi2 AT ATMOSPHERIC PRESSURE FROM IN SITU PREPARED METAL CHLORIDES E. BLANQUET, C. VAHLAS, C. BERNARD, R. MADAR, J. PALLEAU and J. TORRESJ. Phys. Colloques, 50 C5 (1989) C5-557-C5-563DOI: https://doi.org/10.1051/jphyscol:1989565
