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Cited article:

FAST PLASMA DEPOSITION OF CARBON AND SILICON LAYERS

J.J. BEULENS, A.J.M. BUURON, L.A. BISSCHOPS, T.H.J. BISSCHOPS, A.B.M. HUSKEN, G.M.W. KROESEN, G.J. MEEUSEN, C.J. TIMMERMANS, A.T.M. WILBERS, D.C. SCHRAM

J. Phys. Colloques, 51 C5 (1990) C5-361-C5-367

DOI: https://doi.org/10.1051/jphyscol:1990543

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Argon-hydrogen plasma jet investigated by active and passive spectroscopic means

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Anomalous fast recombination in hydrogen plasmas involving rovibrational excitation

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Depolarization Rayleigh scattering as a means of molecular concentration determination in plasmas

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