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Cited article:

MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION OF DIAMOND

L. VANDENBULCKE, P. BOU, R. HERBIN, V. CHOLET, C. BENY

J. Phys. Colloques, 50 C5 (1989) C5-177-C5-188

DOI: https://doi.org/10.1051/jphyscol:1989525

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