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Cited article:
F. SCHMADERER , G. WAHL
J. Phys. Colloques, 50 C5 (1989) C5-119-C5-129
This article has been cited by the following article(s):
7 articles
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Carrier gas‐free chemical vapor deposition technique forinsitupreparation of high quality YBa2Cu3O7−δthin films
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