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Cited article:

Experimental and Simulation Research on the Preparation of Carbon Nano-Materials by Chemical Vapor Deposition

Bo Yang, Lanxing Gao, Miaoxuan Xue, Haihe Wang, Yanqing Hou, Yingchun Luo, Han Xiao, Hailiang Hu, Can Cui, Huanjiang Wang, Jianhui Zhang, Yu-Feng Li, Gang Xie, Xin Tong and Yadian Xie
Materials 14 (23) 7356 (2021)
https://doi.org/10.3390/ma14237356

Modeling of Epitaxial Silicon Growth From the DCS-H2-HCl System in a Large Scale CVD Reactor

Zaher Ramadan, Hamada Mohamed Abdelmotalib and Ik-Tae Im
IEEE Transactions on Semiconductor Manufacturing 31 (3) 363 (2018)
https://doi.org/10.1109/TSM.2018.2844849

IMPORTANCE OF GRID REFINEMENT IN NUMERICAL MODELING OF CHEMICAL VAPOR DEPOSITION PROCESSES

C. L. Leakeas and M. A. R. Sharif
Numerical Heat Transfer, Part B: Fundamentals 42 (1) 19 (2002)
https://doi.org/10.1080/10407790190053815

Proper orthogonal decomposition for flow calculations and optimal control in a horizontal CVD reactor

Hung V. Ly and Hien T. Tran
Quarterly of Applied Mathematics 60 (4) 631 (2002)
https://doi.org/10.1090/qam/1939004