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Cited article:

Material removal model associated with chemical bonding in tantalum chemical mechanical polishing

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Tribology International 110945 (2025)
https://doi.org/10.1016/j.triboint.2025.110945

Interaction mechanism of Al2O3 abrasive in tantalum chemical mechanical polishing

Rui Lei, Liang Jiang, Honglin Zhang, Yushan Chen, Jiaxin Zheng, Junhui Sun, Qijian Zhao and Linmao Qian
RSC Advances 14 (40) 29559 (2024)
https://doi.org/10.1039/D4RA03743J

The Stability Consequences Promoted by Doping Metallic Atoms on the Degradation of Poly (ε-Caprolactone)

Traian Zaharescu, Tunde Borbath, Marius Mariș, Istvan Borbath and Mihaela Mariș
Macromol 2 (3) 391 (2022)
https://doi.org/10.3390/macromol2030025