Articles citing this article

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Cited article:

Composition and thermal-annealing-induced short-range ordering changes in amorphous hydrogenated silicon carbide films as investigated by extended x-ray-absorption fine structure and infrared absorption

M. El Khakani, D. Guay, M. Chaker and X. Feng
Physical Review B 51 (8) 4903 (1995)
https://doi.org/10.1103/PhysRevB.51.4903

Simultaneous analysis of multiple extended x-ray-absorption fine-structure spectra: Application to studies of buried Ge-Si interfaces

P. Aebi, T. Tyliszczak, A. Hitchcock, et al.
Physical Review B 45 (23) 13579 (1992)
https://doi.org/10.1103/PhysRevB.45.13579

Structural investigation of a-Si and a-Si:H using x-ray-absorption spectroscopy at the Si K edge

A. Filipponi, F. Evangelisti, M. Benfatto, S. Mobilio and C. Natoli
Physical Review B 40 (14) 9636 (1989)
https://doi.org/10.1103/PhysRevB.40.9636

Extended x-ray-absorption and electron-energy-loss fine-structure studies of the local atomic structure of amorphous unhydrogenated and hydrogenated silicon carbide

Alain Kaloyeros, Richard Rizk and John Woodhouse
Physical Review B 38 (18) 13099 (1988)
https://doi.org/10.1103/PhysRevB.38.13099

Epitaxial Growth and Band Structure Effects at the Si/Ge(111) Interface

J.C. Woicik, R.S. List, B.B. Pate and P. Pianetta
MRS Proceedings 102 (1987)
https://doi.org/10.1557/PROC-102-283