Articles citing this article

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Cited article:

Monitoring of the growth of microcrystalline silicon by plasma‐enhanced chemical vapor deposition using in‐situ Raman spectroscopy

S. Muthmann, F. Köhler, M. Meier, et al.
physica status solidi (RRL) – Rapid Research Letters 5 (4) 144 (2011)
https://doi.org/10.1002/pssr.201105041

Microcrystalline Silicon Thin-Films Grown by Plasma Enhanced Chemical Vapour Deposition - Growth Mechanisms and Grain Size Control

Pere Roca i Cabarrocas, Anna Fontcuberta i Morral, Billel Kalache and Samir Kasouit
Solid State Phenomena 93 257 (2003)
https://doi.org/10.4028/www.scientific.net/SSP.93.257

In situ spectroellipsometry study of the nucleation and growth of microcrystalline silicon

M. Fang and B. Drévillon
Journal of Applied Physics 70 (9) 4894 (1991)
https://doi.org/10.1063/1.349033

Insituspectroscopic ellipsometry investigation of the nucleation of microcrystalline silicon

B. Drevillon, C. Godet and Satyendra Kumar
Applied Physics Letters 50 (23) 1651 (1987)
https://doi.org/10.1063/1.97757