Articles citing this article

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Cited article:

Investigation of the amorphous‐to‐microcrystalline transition of hydrogenated silicon films by spectroscopic ellipsometry

T. V. Herak, J. J. Schellenberg, P. K. Shufflebotham and K. C. Kao
Journal of Applied Physics 64 (2) 688 (1988)
https://doi.org/10.1063/1.341962

In situ spectroscopic ellipsometry study of the growth of microcrystalline silicon

Satyendra Kumar, B. Drevillon and C. Godet
Journal of Applied Physics 60 (4) 1542 (1986)
https://doi.org/10.1063/1.337289

Dependence of properties of hydrogenated microcrystalline and amorphous silicon films prepared by planar magnetron sputtering in inert gas

N. Saito, H. Sannomiya, T. Yamaguchi and N. Tanaka
Applied Physics A Solids and Surfaces 35 (4) 241 (1984)
https://doi.org/10.1007/BF00617174

Reactive sputtering of amorphous silicon in Ne, Ar, and Kr

R. C. Ross and R. Messier
Journal of Applied Physics 54 (10) 5744 (1983)
https://doi.org/10.1063/1.331797