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Equilibrium calculations for plasmas of volatile halides of III, IV and VI group elements mixed with H2 and H2 + CX4 (X = H, Cl, F) relevant to PECVD of isotopic materials
I. B. Gornushkin, P. G. Sennikov, R. A. Kornev and V. S. Polyakov Journal of Radioanalytical and Nuclear Chemistry 326(1) 407 (2020) https://doi.org/10.1007/s10967-020-07295-2
Amorphous nonstoichiometric Ge1−x–Cx:H compounds obtained by radiolysis-chemical vapor deposition of germane/ethyne or germane/allene systems: A bonding and microstructure investigation performed by x-ray photoelectron spectroscopy and Raman spectroscopy
Paola Benzi, Elena Bottizzo, Chiara Demaria, et al. Journal of Applied Physics 101(12) 124906 (2007) https://doi.org/10.1063/1.2748710
Plasma Deposition of Thin Carbon⧸Germanium Alloy Films from Organogermanium Compounds