Articles citing this article

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Cited article:

Optimum doping level in a-Si:H and a-SiC:H materials

A. Hadjadj, P. St’ahel, P. Roca i Cabarrocas, et al.
Journal of Applied Physics 83 (2) 830 (1998)
https://doi.org/10.1063/1.366764

Hydrogen content of amorphous silicon films deposited in a multipole plasma

B. Drevillon and M. Toulemonde
Journal of Applied Physics 58 (1) 535 (1985)
https://doi.org/10.1063/1.335658

Surface contributions to the two-layer structure in the plasma deposition of a-Si : H

E. Sacher, J. Klemberg-Sapiehat, M. R. Wertheimer, H. P. Schreiber and R. Groleau
Philosophical Magazine B 49 (4) L47 (1984)
https://doi.org/10.1080/13642818408246519

The electrical performance of thinn +-window layers ina-Si: H solar cells

G. M�ller, G. M�ck, M. Simon and G. Winterling
Applied Physics A Solids and Surfaces 29 (2) 63 (1982)
https://doi.org/10.1007/BF00632427