The Citing articles tool gives a list of articles citing the current article. The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program . You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).
Cited article:
J.A. Reimer
J. Phys. Colloques, 42 C4 (1981) C4-715-C4-724
This article has been cited by the following article(s):
17 articles
Springer Handbook of Electronic and Photonic Materials
Kazuo Morigaki and Chisato Ogihara Springer Handbooks, Springer Handbook of Electronic and Photonic Materials 1 (2017) https://doi.org/10.1007/978-3-319-48933-9_24
Springer Handbook of Electronic and Photonic Materials
Kazuo Morigaki and Chisato Ogihara Springer Handbook of Electronic and Photonic Materials 565 (2006) https://doi.org/10.1007/978-0-387-29185-7_25
Fine particle removal by a negatively-charged fine particle collector in silane plasma
Yuji Kurimoto, Naoki Matsuda, Giichiro Uchida, et al. Thin Solid Films 457 (2) 285 (2004) https://doi.org/10.1016/j.tsf.2003.11.300
digital Encyclopedia of Applied Physics
S. R. Elliott digital Encyclopedia of Applied Physics (2003) https://doi.org/10.1002/3527600434.eap019
Experimental and full multiple scattering approaches to energy-loss near-edge structures (ELNES) for c-Si, a-Si and a-Si:H
Kuniko Hayakawa, Takashi Fujikawa and Shunsuke Muto Chemical Physics Letters 371 (3-4) 498 (2003) https://doi.org/10.1016/S0009-2614(03)00308-7
Ternary Compounds, Organic Semiconductors
Landolt-Börnstein - Group III Condensed Matter, Ternary Compounds, Organic Semiconductors 41E 1 (2000) https://doi.org/10.1007/10717201_920
Defect formation during deposition of undoped a-Si:H by rf glow discharge
Keiji Maeda, Ikurou Umezu and Hotaka Ishizuka Physical Review B 55 (7) 4323 (1997) https://doi.org/10.1103/PhysRevB.55.4323
Mechanism of surface reaction in the deposition process ofa-Si:H by rf glow discharge
Keiji Maeda, Atsushi Kuroe and Ikurou Umezu Physical Review B 51 (16) 10635 (1995) https://doi.org/10.1103/PhysRevB.51.10635
Molecular Dynamics Simulation of Hydrogenated Amorphous Silicon with Tersoff Potential
Tatsuya Ohira, Takaji Inamuro and Takeshi Adachi MRS Proceedings 336 (1994) https://doi.org/10.1557/PROC-336-177
Difference in light‐induced annealing behavior of deposition‐ and light‐induced defects in hydrogenated amorphous silicon
N. Hata and A. Matsuda Applied Physics Letters 63 (14) 1948 (1993) https://doi.org/10.1063/1.110610
A structural model of hydrogenated amorphous silicon
V. Drchal and J. Málek Philosophical Magazine B 62 (3) 271 (1990) https://doi.org/10.1080/13642819008208630
The structure of amorphous hydrogenated silicon and its alloys: A review
S.R. Elliott Advances in Physics 38 (1) 1 (1989) https://doi.org/10.1080/00018738900101092
Investigation of the bubble formation mechanism in a-Si:H films by Fourier-transform infrared microspectroscopy
Y. Mishima and T. Yagishita Journal of Applied Physics 64 (8) 3972 (1988) https://doi.org/10.1063/1.341355
Glow-discharge amorphous silicon: Growth process and structure
Kazunobu Tanaka and Akihisa Matsuda Materials Science Reports 2 (4) 139 (1987) https://doi.org/10.1016/S0920-2307(87)80003-8
Fluorine-incorporation scheme in fluorinated amorphous silicon prepared by various methods
Minoru Kumeda, Yukio Takahashi and Tatsuo Shimizu Physical Review B 36 (5) 2713 (1987) https://doi.org/10.1103/PhysRevB.36.2713
Infrared investigations of hydrogenated amorphous silicon. II. The existence of polysilane, (SiH2)n
E. Sacher Philosophical Magazine B 51 (3) 295 (1985) https://doi.org/10.1080/13642818508240575
Plasma polymerization and deposition of amorphous hydrogenated silicon from rf and dc silane plasmas
R. C. Ross and J. Jaklik Journal of Applied Physics 55 (10) 3785 (1984) https://doi.org/10.1063/1.332935