The Citing articles tool gives a list of articles citing the current article. The citing articles come from EDP Sciences database, as well as other publishers participating in CrossRef Cited-by Linking Program . You can set up your personal account to receive an email alert each time this article is cited by a new article (see the menu on the right-hand side of the abstract page).
Cited article:
M. Hirose
J. Phys. Colloques, 42 C4 (1981) C4-705-C4-714
This article has been cited by the following article(s):
15 articles
Handbook of Thin Films
Wilfried G.J.H.M. van Sark Handbook of Thin Films 1 (2002) https://doi.org/10.1016/B978-012512908-4/50004-7
Advances in Plasma-Grown Hydrogenated Films
Wilfried G.J.H.M. Van Sark Thin Films and Nanostructures, Advances in Plasma-Grown Hydrogenated Films 30 1 (2002) https://doi.org/10.1016/S1079-4050(02)80004-7
Ternary Compounds, Organic Semiconductors
Landolt-Börnstein - Group III Condensed Matter, Ternary Compounds, Organic Semiconductors 41E 1 (2000) https://doi.org/10.1007/10717201_919
Ternary Compounds, Organic Semiconductors
Landolt-Börnstein - Group III Condensed Matter, Ternary Compounds, Organic Semiconductors 41E 1 (2000) https://doi.org/10.1007/10717201_941
Monohydride clustering in the amorphous silicon matrix
L.S Sidhu and S Zukotynski Journal of Non-Crystalline Solids 246 (1-2) 65 (1999) https://doi.org/10.1016/S0022-3093(99)00018-6
Plasma Deposition of Amorphous Silicon-Based Materials
Arun Madan Plasma Deposition of Amorphous Silicon-Based Materials 243 (1995) https://doi.org/10.1016/B978-012137940-7/50006-1
Surface Characterization of Hydrogenated Silicon Powder Made by the Laser-Induced Decomposition of Silane
THOMAS M. KRAMER, WENDELL E. RHINE and H. KENT BOWEN Advanced Ceramic Materials 3 (3) 244 (1988) https://doi.org/10.1111/j.1551-2916.1988.tb00210.x
Insitustudy ofp‐type amorphous silicon growth from B2H6:SiH4mixtures: Surface reactivity and interface effects
R. W. Collins Applied Physics Letters 53 (12) 1086 (1988) https://doi.org/10.1063/1.100029
Laser-induced chemical vapor deposition of hydrogenated amorphous silicon. II. Film properties
M. Meunier, J. H. Flint, J. S. Haggerty and D. Adler Journal of Applied Physics 62 (7) 2822 (1987) https://doi.org/10.1063/1.339413
Optical absorption and photoluminescence of glow-discharge amorphous Si:F films
M. Janai and R. A. Street Physical Review B 31 (10) 6609 (1985) https://doi.org/10.1103/PhysRevB.31.6609
Defects and microvoids in a-Si and a-Si:H
Ai-Lien Jung, Yi-Hua Wang, Gang Liu, et al. Journal of Non-Crystalline Solids 74 (1) 19 (1985) https://doi.org/10.1016/0022-3093(85)90396-5
Defect States in Silicon Nitride
John Robertson and Martin J. Powell MRS Proceedings 49 (1985) https://doi.org/10.1557/PROC-49-215
Impurity doping in chemically vapor-deposited amorphous hydrogenated silicon from disilane
Y. Ashida, Y. Mishima, M. Hirose and Y. Osaka Journal of Applied Physics 55 (6) 1425 (1984) https://doi.org/10.1063/1.333395
Plasma-hydrogenation effects and the thickness dependence of electrical properties and E.S.R. in undoped CVD a-Si
S. Hasegawa, D. Ando, Y. Kurata and T. Shimizu Philosophical Magazine B 47 (2) 139 (1983) https://doi.org/10.1080/13642812.1983.9728426
Fourth E.C. Photovoltaic Solar Energy Conference
N. Szydlo, E. Chartier, N. Proust, J. Magariño and D. Kaplan Fourth E.C. Photovoltaic Solar Energy Conference 749 (1982) https://doi.org/10.1007/978-94-009-7898-0_123