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Cited article:

Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning

Jacqueline van Veldhoven, Aneta S. Stodolna, Arnold Storm, et al.
IEEE Transactions on Plasma Science 49 (10) 3132 (2021)
https://doi.org/10.1109/TPS.2021.3110423

Small-angle scattering of ions from random targets in the screened coulomb region

J.V. Vukanić and R.K. Janev
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 16 (1) 22 (1986)
https://doi.org/10.1016/0168-583X(86)90222-3