Supplément au Journal de Physique Colloques

NONSELECTIVE W/WSi_x -CVD TECHNOLOGY FOR LOW RESISTANCE VIA PLUGS ON ALUMINUM

E. BERTAGNOLLI, C. WIECZOREK, B. HOFFMANN and H. SCHABER

J. Phys. Colloques, 49 C4 (1988) C4-179-C4-182

DOI: 10.1051/jphyscol:1988436

E. BERTAGNOLLI

C. WIECZOREK

B. HOFFMANN

H. SCHABER

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)