STRUCTURAL AND ELECTRONIC PROPERTIES OF CVD SILICON FILMS NEAR THE CRYSTALLIZATION TEMPERATURE J. Magariño, D. Kaplan, R. Bisaro, J.F. Morhange et K. Zellama J. Phys. Colloques, 43 C1 (1982) C1-271-C1-276 DOI: 10.1051/jphyscol:1982137