GRAIN BOUNDARY SELF AND IMPURITY DIFFUSION IN TUNGSTEN IN THE TEMPERATURE RANGE OF ACTIVATED SINTERING J. S. LEE, K. KLOCKGETER et Chr. HERZIGJ. Phys. Colloques, 51 C1 (1990) C1-569-C1-574DOI: https://doi.org/10.1051/jphyscol:1990189