MOCVD AND PLASMA MOCVD OF METAL OXIDE FILMS P. S. WEGLICKI, Z. CAO, N. W. SKILLEN, J. R. OWEN et P. T. MOSELEYJ. Phys. Colloques, 50 C5 (1989) C5-779DOI: https://doi.org/10.1051/jphyscol:1989594
