HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS DING-KUN PENG, CHUN-LIN WANG et GUANG-YAO MENGJ. Phys. Colloques, 50 C5 (1989) C5-667-C5-672DOI: https://doi.org/10.1051/jphyscol:1989578
