KINETICS OF THE CHEMICAL VAPOR DEPOSITION OF SILICON NITRIDE-FROM Si(CH3)4/ NH3/H2 GAS MIXTURES N. ROELS, T. LECOINTE, R. GUINEBRETIERE et J. DESMAISONJ. Phys. Colloques, 50 C5 (1989) C5-435-C5-444DOI: https://doi.org/10.1051/jphyscol:1989555
