CHARACTERIZATION OF INTRINSIC STRESSES OF PECVD SILICON NITRIDE FILMS DEPOSITED IN A HOT-WALL REACTOR K. AITE, R. KOEKOEK, J. HOLLEMAN et J. MIDDELHOEKJ. Phys. Colloques, 50 C5 (1989) C5-323-C5-331DOI: https://doi.org/10.1051/jphyscol:1989539
