MODELING OF COLD WALL CHEMICAL VAPOR DEPOSITION REACTORS (FOR SEMICONDUCTOR FABRICATION) M. PONS, R. KLEIN, C. ARENA et S. MARIAUXJ. Phys. Colloques, 50 C5 (1989) C5-57-C5-65DOI: https://doi.org/10.1051/jphyscol:1989510
