A MATHEMATICAL MODEL OF THE SILICON CHEMICAL VAPOR DEPOSITION IN A ATMOSPHERIC PRESSURE COLD-WALL REACTOR Y. J. PARK, G. J. MIN, Y. W. PARK, C. O. PARK et J. S. CHUNJ. Phys. Colloques, 50 C5 (1989) C5-45DOI: https://doi.org/10.1051/jphyscol:1989508
