CONVECTION AND CHEMISTRY EFFECTS IN CVD - A 3-D ANALYSIS FOR SILICON DEPOSITION S. A. GOKOGLU, M. KUCZMARSKI, P. TSUI et A. CHAITJ. Phys. Colloques, 50 C5 (1989) C5-17-C5-34DOI: https://doi.org/10.1051/jphyscol:1989506
