RAPID THERMAL PROCESSING OF ARSENIC-IMPLANTED POLYSILICON ON VERY THIN OXIDE J.Y.-C. SUN, R. ANGELUCCI, C.Y. WONG, G. SCILLA et E. LANDIJ. Phys. Colloques, 49 C4 (1988) C4-401-C4-404DOI: https://doi.org/10.1051/jphyscol:1988484