PLASMA ANODISATION OF SILICON FOR ADVANCED VLSI S. TAYLOR, W. ECCLESTON, J. RINGNALDA, D. M. MAHER, D. J. EAGLESHAM, C. J. HUMPHREYS et D. J. GODFREYJ. Phys. Colloques, 49 C4 (1988) C4-393-C4-396DOI: https://doi.org/10.1051/jphyscol:1988482
