DEVICE CHARACTERISATION OF A HIGH DENSITY HALF-MICRON CMOS PROCESS P. H. WOERLEE, C. A.H. JUFFERMANS, H. LIFKA, A. J. WALKER, T. POORTER, H. J.H. MERKS-EPPINGBROEK et F. M. OUDE LANSINKJ. Phys. Colloques, 49 C4 (1988) C4-33-C4-36DOI: https://doi.org/10.1051/jphyscol:1988405
