ANNEALING OF HIGH DOSE IMPLANTED GaAs WITH HALOGEN LAMPS Y. I. Nissim, B. Joukoff, J. Sapriel et N. DuhamelJ. Phys. Colloques, 44 C5 (1983) C5-247-C5-251DOI: https://doi.org/10.1051/jphyscol:1983539
