PARAMETERS CONTROLLING THE DEPOSITION OF AMORPHOUS AND MICROCRYSTALLINE SILICON IN Si/H DISCHARGE PLASMAS S. vepŸek, Z. Iqbal, H. R. Oswald, F. A. Sarott et J. J. WagnerJ. Phys. Colloques, 42 C4 (1981) C4-251-C4-255DOI: https://doi.org/10.1051/jphyscol:1981453
