STRUCTURAL AND ELECTRICAL PROPERTIES OF NOBLE METAL-HYDROGENATED AMORPHOUS SILICON INTERFACES C. C. Tsai, M. J. Thompson et R. J. NemanichJ. Phys. Colloques, 42 C4 (1981) C4-1077-C4-1080DOI: https://doi.org/10.1051/jphyscol:19814236
