HYDROGEN PROFILING IN GAS PHASE DOPED AND ION IMPLANTED AMORPHOUS SILICON FILMS F. J. Demond, G. Müller, H. Damjantschitsch, H. Mannsperger, S. Kalbitzer, P. G. Le Comber et W. E. SpearJ. Phys. Colloques, 42 C4 (1981) C4-779-C4-782DOI: https://doi.org/10.1051/jphyscol:19814170
