INFLUENCE OF HYDROGEN PARTIAL PRESSURE ON DEPOSITION AND PROPERTIES OF SPUTTERED AMORPHOUS GALLIUM ARSENIDE L. Alimoussa, H. Carchano et J. P. ThomasJ. Phys. Colloques, 42 C4 (1981) C4-683-C4-686DOI: https://doi.org/10.1051/jphyscol:19814151
