INFERIOR ELECTRONIC PROPERTIES OF RF-SPUTTERED a-Si : H FILMS WITH ONLY THE 2000-cm-1 IR ABSORPTION BAND S. Oguz, D. K. Paul, J. Blake, R. W. Collins, A. Lachter, B. G. Yacobi et W. PaulJ. Phys. Colloques, 42 C4 (1981) C4-679-C4-682DOI: https://doi.org/10.1051/jphyscol:19814150
