PROPERTIES OF PURE SILICON AMORPHOUS FILMS PREPARED BY rf-BIAS SPUTTERING M. Suzuki, T. Maekawa, Y. Kakimoto et T. BandowJ. Phys. Colloques, 42 C4 (1981) C4-623-C4-626DOI: https://doi.org/10.1051/jphyscol:19814136
