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Cited article:

Increasing the spatial uniformity of SiO2 films produced by plasma enhanced chemical vapor deposition using capacitively coupled plasmas with structured electrodes

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Low-pressure inductively coupled plasmas in hydrogen: impact of gas heating on the spatial distribution of atomic hydrogen and vibrationally excited states

Gregory J Smith, Paola Diomede, Andrew R Gibson, Scott J Doyle, Vasco Guerra, Mark J Kushner, Timo Gans and James P Dedrick
Plasma Sources Science and Technology 33 (2) 025002 (2024)
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A regression model for plasma reaction kinetics

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Journal of Physics D: Applied Physics 56 (37) 374001 (2023)
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Chemical kinetics and density measurements of OH in an atmospheric pressure He + O2 + H2O radiofrequency plasma

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Journal of Physics D: Applied Physics 54 (28) 285201 (2021)
https://doi.org/10.1088/1361-6463/abefec

A hybrid computational framework for the simulation of atmospheric pressure plasma jets: the importance of the gas flow model

Dimitrios Passaras, Eleftherios Amanatides and George Kokkoris
Plasma Sources Science and Technology 30 (12) 125018 (2021)
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On the scaling of rf and dc self-bias voltages with pressure in electronegative capacitively coupled plasmas

Ankur Agarwal, Leonid Dorf, Shahid Rauf and Ken Collins
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (2) (2012)
https://doi.org/10.1116/1.3676182

Self-consistent electrodynamics of large-area high-frequency capacitive plasma discharge

Zhigang Chen, Shahid Rauf and Ken Collins
Journal of Applied Physics 108 (7) 073301 (2010)
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Simulation of electrical discharges in gases. Uniform electric fields

G.R.G. Raju and Jianfen Liu
IEEE Transactions on Dielectrics and Electrical Insulation 2 (5) 1004 (1995)
https://doi.org/10.1109/94.469989