| Numéro |
J. Phys. Colloques
Volume 41, Numéro C9, Novembre 1980
Third International Symposium on Gas-Flow and Chemical Lasers
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|---|---|---|
| Page(s) | C9-9 - C9-15 | |
| DOI | https://doi.org/10.1051/jphyscol:1980902 | |
Third International Symposium on Gas-Flow and Chemical Lasers
J. Phys. Colloques 41 (1980) C9-9-C9-15
DOI: 10.1051/jphyscol:1980902
Michigan State University, East Lansing, Michigan 48824, U.S.A.
J. Phys. Colloques 41 (1980) C9-9-C9-15
DOI: 10.1051/jphyscol:1980902
AN ANALYSIS OF THE ROLE OF KINETIC MECHANISMS AFFECTING H2 + F2 LASER PERFORMANCE
R.L. Kerber et R.C. BrownMichigan State University, East Lansing, Michigan 48824, U.S.A.
Abstract
Computer simulations of pulsed H2 + F2 chemical laser performance have been made with a comprehensive model of VRT relaxation mechanisms in HF. The study includes an in-depth analysis of the role of vibrational to rotational, rotational to rotational, vibrational to vibrational and rotational and vibrational to translational relaxation mechanisms in HF lasers. The study also examines the effect of rotational to rotational lasing on P-branch laser energy. The model is used to assess the strengths and weakness in our current understanding of HF relaxation kinetics through comparisons with experiment. Model predictions are found to be in good agreement with experiment.