Table of contents
Le Journal de Physique Colloques
Vol. 50 No. C5 (Mai 1989)
Actes de la 7ème Conférence Européenne sur les Dépôts Chimiques en Phase Gazeuse / Proceedings of the Seventh European Conference on Chemical Vapour Deposition
- THE APPLICATION OF INFRARED SPECTROSCOPY TO THE DETECTION OF SURFACE INTERMEDIATES IN CVD
p. C5-1
M.A. CHESTERS
PDF file (7.899 KB) - ÉTUDE PAR PHOTOÉMISSION DE L'ADSORPTION DE DISILANE SUR Si (111) 7x7
p. C5-3
M. ALAOUI, F. RINGEISEN, D. MULLER, D. BOLMONT and J.J. KOULMANN
Abstract | PDF file (314.0 KB) - SPECTROSCOPIE RAMAN COHÉRENTE DANS UN RÉACTEUR CVD
p. C5-13
N. HERLIN, M. LEFEBVRE, M. PÉALAT and M. PARLIER
PDF file (8.155 KB) - MÉTHODE D'ANALYSE DE GAZ EN AMONT ET EN AVAL DE RÉACTEURS DE MOVPE EN VUE DE LA MISE AU POINT DE PROCESS
p. C5-14
B. CROS, M. STOEHR, M. MAURIN, A. MATHIEU, J.-M. FABRE and L. GIRAL
PDF file (12.82 KB) - MONTAGE RAMAN DE HAUTES PERFORMANCES ADAPTÉ A LA CARACTÉRISATION DE LA PHASE GAZEUSE DANS DES OPÉRATIONS DE DÉPÔT CHIMIQUE EN PHASE VAPEUR. RÉSULTATS PRÉLIMINAIRES
p. C5-15
R. GAUFRES, P. HUGUET, D. BOYA and L. LAFFORET
PDF file (12.47 KB) - CONVECTION AND CHEMISTRY EFFECTS IN CVD - A 3-D ANALYSIS FOR SILICON DEPOSITION
p. C5-17
S.A. GOKOGLU, M. KUCZMARSKI, P. TSUI and A. CHAIT
Abstract | PDF file (2.331 MB) - A TWO DIMENSIONAL MODEL FOR LPCVD REACTORS HYDRODYNAMICS AND MASS TRANSFER
p. C5-35
C. VINANTE, P. DUVERNEUIL and J.P. COUDERC
Abstract | PDF file (670.7 KB) - A MATHEMATICAL MODEL OF THE SILICON CHEMICAL VAPOR DEPOSITION IN A ATMOSPHERIC PRESSURE COLD-WALL REACTOR
p. C5-45
Y.J. PARK, G.J. MIN, Y.W. PARK, C.O. PARK and J.S. CHUN
Abstract | PDF file (26.43 KB) - SIMULATION DU TRANSFERT DE CHALEUR ET DE QUANTITÉ DE MOUVEMENT DANS UN REACTEUR DE VAPODÉPOSITION
p. C5-47
H. CHEHOUANI, B. ARMAS, S. BENET and S. BRUNET
Abstract | PDF file (1.895 MB) - MODELING OF COLD WALL CHEMICAL VAPOR DEPOSITION REACTORS (FOR SEMICONDUCTOR FABRICATION)
p. C5-57
M. PONS, R. KLEIN, C. ARENA and S. MARIAUX
Abstract | PDF file (1.475 MB) - MODELING OF LPCVD SILICON NITRIDE PROCESS
p. C5-67
JI-TAO WANG, SHI-LI ZHANG, YONG-FA WANG, WEI ZHANG, ZHENG-CHANG CHEN, KE-YUN ZHANG and YUAN-FANG WANG
Abstract | PDF file (197.5 KB) - EXPERIMENTAL AND THEORETICAL DEPOSITION PROFILES FOR STATIC AND DYNAMIC PCVD WITH WF6/H2 AND/OR ORGANOMETALLIC STARTING COMPOUNDS
p. C5-73
G. GÄRTNER, P. JANIEL and F. WELING
Abstract | PDF file (735.9 KB) - PROCESS CHARACTERISATION FOR LPCVD DEPOSITION OF SiO2 FILMS FROM TEOS LIQUID SOURCE
p. C5-83
S. ROJAS, P. SERRA, W.S. WU, F. SANTARELLI, G.C. SARTI and F. MINNI
Abstract | PDF file (359.5 KB) - CVD MODIFICATION OF CERAMIC MEMBRANES : SIMULATION AND PRELIMINARY RESULTS
p. C5-91
Y.S. LIN, K.J. DE VRIES and A.J. BURGGAAF
PDF file (29.37 KB) - ON THE KINETICS OF THE CVD OF Si FROM SiH2Cl2/H2 AND SiC FROM CH3SiCl3/H2 IN A VERTICAL TUBULAR HOT-WALL REACTOR
p. C5-93
F. LANGLAIS, C. PREBENDE, B. TARRIDE and R. NASLAIN
Abstract | PDF file (434.5 KB) - THERMODYNAMIC CALCULATION OF THE TWO PHASED DEPOSITION DOMAINS WITH SiC IN THE Si-Ti-C-Cl-H CHEMICAL SYSTEM
p. C5-105
M. TOUANEN, F. TEYSSANDIER and M. DUCARROIR
Abstract | PDF file (520.9 KB) - HIGH Tc SUPERCONDUCTING THIN FILMS BY ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION
p. C5-117
B. GALLOIS
PDF file (7.742 KB) - CVD OF SUPERCONDUCTIVE YBa2 Cu3 O7-δ
p. C5-119
F. SCHMADERER and G. WAHL
Abstract | PDF file (1.737 MB) - PREPARATION OF SUPERCONDUCTING-OXIDE FILMS BY CVD AND THEIR PROPERTIES
p. C5-131
H. YAMANE, H. KUROSAWA and T. HIRAI
Abstract | PDF file (1.407 MB) - NEW TECHNIQUE FOR THE DEPOSITION OF HIGH Tc SUPERCONDUCTING FILMS
p. C5-141
M. LANGLET, E. SENET, J.L. DESCHANVRES, G. DELABOUGLISE, F. WEISS and J.C. JOUBERT
Abstract | PDF file (646.8 KB) - STUDY OF THE PREPARATION OF HIGH Tc SUPERCONDUCTING YBCO THIN FILMS BY A PLASMA-ASSISTED MOCVD PROCESS
p. C5-149
DING-KUN PENG, GUANG-YAO MENG, CHUN-BAO CAO, CHUN-LIN WANG, QI FANG, YUE-HUAN WU and YU-HENG ZHANG
Abstract | PDF file (754.2 KB) - THE BASIC LAWS OF THE CHEMICAL CRYSTALLIZATION OF DIAMOND FROM THE GAS PHASE
p. C5-157
B.V. DERJAGUIN and D.V. FEDOSEEV
PDF file (8.174 KB) - DEPOSITION OF DIAMOND LAYERS BY HOT-FILAMENT ACTIVATED CVD USING ACETONE AS A CARBON SOURCE
p. C5-159
S. OKOLI, R. HAUBNER and B. LUX
Abstract | PDF file (2.360 MB) - INFLUENCE OF THE COBALT CONTENT IN HOT-PRESSED CEMENTED CARBIDES ON THE DEPOSITION OF LOW-PRESSURE DIAMOND LAYERS
p. C5-169
R. HAUBNER and B. LUX
Abstract | PDF file (2.488 MB) - MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION OF DIAMOND
p. C5-177
L. VANDENBULCKE, P. BOU, R. HERBIN, V. CHOLET and C. BENY
Abstract | PDF file (2.458 MB) - THE CVI-PROCESSING OF CERAMIC MATRIX COMPOSITES
p. C5-191
R. NASLAIN, F. LANGLAIS and R. FEDOU
Abstract | PDF file (666.1 KB) - PREPARATION OF SIC-WHISKER REINFORCED CVD-SIC
p. C5-209
E. FITZER, W. REMMELE and G. SCHOCH
Abstract | PDF file (822.0 KB) - CVD GROWTH AND MORPHOLOGY OF Ti (C, N) WHISKERS
p. C5-219
H. SCHACHNER, G. HORLAVILLE and P. FONTAINE
Abstract | PDF file (3.398 MB) - A METHOD FOR RAPID CHEMICAL VAPOR INFILTRATION OF CERAMIC COMPOSITES
p. C5-229
T.M. BESMANN, R.A. LOWDEN, D.P. STINTON and T.L. STARR
Abstract | PDF file (1.232 MB) - AUTOCAR LAMPS COATED WITH A YELLOW MULTILAYER FILTER BY LPCVD
p. C5-241
C.A.M. MULDER, W.H.M.M. VAN DE SPIJKER, J. JENSMA, G. VERSPUI and G.H.C. HEIJNEN
Abstract | PDF file (293.2 KB) - CARACTÉRISATION ET PROPRIÉTÉS DES FIBRES DE CARBONE REVÊTUES DE CARBURES RÉFRACTAIRES DÉPOSÉS PAR CVD RÉACTIVE
p. C5-249
H. VINCENT, B. BONNETOT, J. BOUIX, H. MOURICHOUX and C. VINCENT
Abstract | PDF file (1.345 MB) - MECHANICAL RESPONSE AND RUPTURE MODES OF SiC/C CVD LAMELLAR COMPOSITES
p. C5-259
M. IGNAT, M. NADAL, C. BERNARD, M. DUCARROIR and F. TEYSSANDIER
Abstract | PDF file (1.129 MB) - MATÉRIAUX CARBONES OBTENUS PAR DÉPÔT CHIMIQUE EN PHASE VAPEUR ASSISTÉ PAR UN PLASMA RÉACTIF
p. C5-269
O. LÉVESQUE, M. RICCI, M. TRINQUECOSTE and P. DELHAÈS
Abstract | PDF file (337.8 KB) - SILICON CARBIDE CHEMICAL VAPOUR INFILTRATION
p. C5-281
Y.G. ROMAN and L.R. WOLFF
Abstract | PDF file (32.70 KB) - THE DEVELOPMENT OF AN IMPROVED MULTILAYER CVD COATING FOR METALCUTTING APPLICATIONS
p. C5-282
K.E. UNDERCOFFER, B.K. DOWNEY, F.B. BATTAGLIA and W.A. BRYANT
PDF file (10.06 KB) - ASPECTS OF ELECTRON PROBE MICROANALYSIS APPLIED TO THE CHARACTERIZATION OF COATINGS
p. C5-285
P. WILLICH and D. OBERTOP
Abstract | PDF file (439.3 KB) - COATINGS CHARACTERIZATIONS BY THE MIRAGE EFFECT AND THE PHOTOTHERMAL MICROSCOPE
p. C5-295
J.P. ROGER, D. FOURNIER, A.C. BOCCARA and F. LEPOUTRE
Abstract | PDF file (553.4 KB) - BORON CARBIDE COATINGS : CORRELATION BETWEEN MECHANICAL PROPERTIES AND LPCVD PARAMETERS VALUES
p. C5-311
J. REY, G. MALE, Ph. KAPSA and J.L. LOUBET
Abstract | PDF file (1.532 MB) - CHARACTERIZATION OF INTRINSIC STRESSES OF PECVD SILICON NITRIDE FILMS DEPOSITED IN A HOT-WALL REACTOR
p. C5-323
K. AITE, R. KOEKOEK, J. HOLLEMAN and J. MIDDELHOEK
Abstract | PDF file (281.1 KB) - AES, XPS AND TEM CHARACTERIZATION OF BORON NITRIDE DEPOSITED UNDER CHEMICAL VAPOR INFILTRATION (CVI) CONDITIONS
p. C5-333
O. DUGNE, S. PROUHET, A. GUETTE, R. NASLAIN, R. FOURMEAUX, K. HSSEIN, J. SEVELY, C. GUIMON, D. GONBEAU and G. PFISTER-GUILLOUZO
Abstract | PDF file (1.033 MB) - CARACTÉRISATION DE COUCHES MINCES DE VERRES DE CHALCOGENURE PRÉPARÉES PAR PECVD
p. C5-343
B. CROS, H. CAMON, Y. BROCHETON, J.P. GONCHOND, A. TISSIER, J.L. BALLADORE and M. RIBES
Abstract | PDF file (2.485 MB) - COMPORTEMENT PHYSICO-CHIMIQUE DE Si3N4 OBTENU PAR LPCVD SOUMIS A DES FLUX RADIATIFS INTENSES
p. C5-353
A. WANG, D. THENEGAL, C. ROYERE, C. DUPUY and B. ARMAS
Abstract | PDF file (1.816 MB) - CARACTÉRISATION DES MÉTAUX RÉFRACTAIRES DE HAUTE PURETÉ OBTENUS PAR CVD
p. C5-363
P. NETTER
PDF file (7.922 KB) - CVD OF TITANIUM CARBIDE AT MODERATE TEMPERATURE FROM TITANIUM SUBCHLORIDES
p. C5-367
B. DROUIN-LADOUCE, J.P. PITON and L. VANDENBULCKE
Abstract | PDF file (1.084 MB) - MICROSTRUCTURE OF CVD - Al2O3
p. C5-377
C. CHATFIELD, J.N. LINDSTRÖM and M.E. SJÖSTRAND
Abstract | PDF file (2.102 MB) - CVD OF YTTRIA STABILIZED ZIRCONIA
p. C5-389
J. WAHLROOS, K. TARKKELL, T.A. MANTYLA and P.O. KETTUNEN
PDF file (7.962 KB) - PHASE TRANSFORMATION DURING CVD OF ALUMINIUM OXIDE
p. C5-391
E. FREDRIKSSON and J.-O. CARLSSON
Abstract | PDF file (1.339 MB) - TITANIA-COATINGS ON STRONGLY PASSIVATED SUBSTRATES
p. C5-401
W. HAENNI, H.E. HINTERMANN, D. MOREL and A. SIMMEN
Abstract | PDF file (1.320 MB) - LTO - SiO2 DEPOSITION IN A STAGNATION FLOW LPCVD SYSTEM
p. C5-411
R. WEBER, G. WAHL and R. HUBER
Abstract | PDF file (1.066 MB) - HARDNESS AND DIMENSIONS OF STEELS WITH HARD COATINGS PRODUCED BY CHEMICAL VAPOUR DEPOSITION AT MEDIUM TEMPERATURES
p. C5-421
W. RUPPERT
Abstract | PDF file (41.13 KB) - A COMPARISON BETWEEN CVD AND PVD COATED CEMENTED CARBIDE CUTTING TOOLS
p. C5-422
R. PORAT and Y. CASSUTO
PDF file (7.528 KB) - LOW PRESSURE CHEMICAL VAPOR DEPOSITION (CVD) ON OXIDE AND NONOXIDE CERAMIC CUTTING TOOLS
p. C5-423
A. LAYYOUS and R. WERTHEIM
Abstract | PDF file (1.329 MB) - PROTECTIVE CVD COATINGS FOR THE TOOL INDUSTRY : REQUIREMENTS FOR PROCESS CONTROL AND EQUIPMENT
p. C5-433
E. MOHN, R. BONETTI and H. WIPRÄCHTIGER
PDF file (8.755 KB) - MORPHOLOGICAL ASPECTS OF SILICON CARBIDE CHEMICALLY VAPOR-DEPOSITED ON GRAPHITE
p. C5-434
A. PARRETTA, A. CAMANZI, G. GIUNTA, V. ADONCECCHI, P. ALESSANDRINI and A. MAZZARANO
Abstract | PDF file (24.51 KB) - KINETICS OF THE CHEMICAL VAPOR DEPOSITION OF SILICON NITRIDE-FROM Si(CH3)4/ NH3/H2 GAS MIXTURES
p. C5-435
N. ROELS, T. LECOINTE, R. GUINEBRETIERE and J. DESMAISON
Abstract | PDF file (554.1 KB) - TITANIUM CARBIDE COATINGS ON STEEL : STUDY OF THE CONDITIONS OF ELABORATION AND OF SUBSTRATE-COATING INTERACTIONS
p. C5-445
A. DERRE, F. TEYSSANDIER and M. DUCARROIR
Abstract | PDF file (1.487 MB) - ÉTUDE, PAR LA MÉTHODE DES RADIOTRACEURS, DE LA DIFFUSION DU FER DANS LE SILICIURE DE FER Fe3Si OBTENU PAR CVD
p. C5-455
S. AUDISIO and P. GUIRALDENQ
Abstract | PDF file (517.8 KB) - LPCVD SILICON FOR ACTIVE DEVICES
p. C5-467
B. LOISEL, L. HAJI and M. GUENDOUZ
Abstract | PDF file (2.398 MB) - CHEMICAL VAPOR DEPOSITION OF REFRACTORY METALS DISILICIDES : A REVIEW
p. C5-479
R. MADAR and C. BERNARD
Abstract | PDF file (1.527 MB) - HETEROEPITAXY OF COVALENT SEMICONDUCTORS : FUNDAMENTALS, GROWTH AND CRYSTAL PROPERTIES
p. C5-499
A. FREUNDLICH
Abstract | PDF file (2.253 MB) - EPITAXIAL SILICON GROWTH IN A REDUCED PRESSURE AND TEMPERATURE CVD REACTOR
p. C5-519
J. L. REGOLINI, D. BENSAHEL, J. MERCIER and E. SCHEID
Abstract | PDF file (311.5 KB) - GROWTH ANISOTROPY AND REACTIONS MECHANISMS IN METAL ORGANICS VAPOR PHASE
EPITAXY OF GaAs
p. C5-529
P. GIBART, A. TROMSON-CARLI, Y. MONTEIL and A. RUDRA
Abstract | PDF file (2.282 MB) - GROWTH CONDITION ANALYSIS AND CHARACTERIZATION OF HIGH PERFECTION InGaAs/InP LAYERS GROWN BY HYDRIDE VPE
p. C5-539
G. ATTOLINI, C. BOCCHI, C. FRIGERI and C. PELOSI
Abstract | PDF file (2.586 MB) - ÉTUDE THERMODYNAMIQUE DU PROCESSUS DE DÉPÔT PAR LA TECHNIQUE DU "MUR CHAUD" - APPLICATION AUX SYSTÈMES Pb-Te, Pb-Se, Pb-Se-Te
p. C5-549
M. MULLER, B. LIAUTARD, R. ASTIER, G. BRUN and J.C. TEDENAC
Abstract | PDF file (841.9 KB) - CHEMICAL VAPOR DEPOSITION OF TaSi2 AND WSi2 AT ATMOSPHERIC PRESSURE FROM IN SITU PREPARED METAL CHLORIDES
p. C5-557
E. BLANQUET, C. VAHLAS, C. BERNARD, R. MADAR, J. PALLEAU and J. TORRES
Abstract | PDF file (958.9 KB) - DEPOSITION AND STUDY OF CARBONYL CVD-W THIN FILMS
p. C5-565
K.A. GESHEVA and G.S. BESHKOV
Abstract | PDF file (15.34 KB) - CHEMICAL VAPOUR DEPOSITION OF THIN FILMS IN THE SYSTEM B-P
p. C5-567
E.M. KELDER, A. GOOSSENS, P.J. VAN DER PUT and J. SCHOONMAN
Abstract | PDF file (1.116 MB) - AN INDUSTRIAL PROCESS FOR BPSG-TEOS
p. C5-575
P. EPPENGA, E. SCHUIVENS and M. HENDRIKS
Abstract | PDF file (1.209 MB) - AN INFLUENCE OF DOPING ON THE KINETICS OF BPSG DEPOSITION PROCESS AND THE PROPERTIES OF THE DEPOSITED LAYER
p. C5-585
P.B. GRABIEC and S.M. PIETRUSZKO
Abstract | PDF file (315.0 KB) - QLTO, A CLASSICAL PROCESS STILL GOING STRONG
p. C5-595
W. VAN HEUMEN and M. HENDRIKS
Abstract | PDF file (929.0 KB) - THE PREPARATION AND PROPERTIES OF PECVD-MADE SnO2 THIN FILMS
p. C5-605
Y.P. CHEN, Z.Q. ZHENG, S.Y. LI and H.L. MA
Abstract | PDF file (234.4 KB) - PROPERTIES OF SnO2 : F FILMS PREPARED BY APCVD
p. C5-613
F. ZONG, S. HAN and S. LI
Abstract | PDF file (18.75 KB) - FUNDAMENTALS OF THE PLASMA INDUCED AND ASSISTED CVD : PLASMA PARAMETERS CONTROLLING THE CHEMICAL EQUILIBRIUM, THE DEPOSITION KINETICS AND THE PROPERTIES OF THE FILMS
p. C5-617
S. VEPžEK
Abstract | PDF file (588.9 KB) - PYROLYTIC DECOMPOSITION OF SILANE ON LASER-IRRADIATED SILICA SUBSTRATES
p. C5-637
D. TONNEAU, Y. PAULEAU and G. AUVERT
Abstract | PDF file (376.6 KB) - LASER-INDUCED DECOMPOSITION OF METAL CARBONYLS FOR CHEMICAL VAPOR DEPOSITION OF MICROSTRUCTURES
p. C5-647
D. TONNEAU, G. AUVERT and Y. PAULEAU
Abstract | PDF file (421.2 KB) - AMORPHOUS SILICON NITRIDE THIN FILMS PERFORMED IN TWO PECVD EXPERIMENTAL DEVICES
p. C5-657
J. L. JAUBERTEAU, M. I. BARATON, MM. GERBIER, P. QUINTARD, J. DESMAISON, J. AUBRETON and A. CATHERINOT
Abstract | PDF file (253.2 KB) - PACVD OF "DIAMOND-LIKE" CARBON FILMS IN MICROWAVE MULTIPOLAR PLASMAS
p. C5-665
M. MORIN and L. VANDENBULCKE
PDF file (8.799 KB) - HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS
p. C5-667
DING-KUN PENG, CHUN-LIN WANG and GUANG-YAO MENG
Abstract | PDF file (886.5 KB) - UV PHOTON ASSISTED CVD OF SiO2 FOR LOW-DRIFT InP MISFET'S
p. C5-675
P. DIMITRIOU, G. POST and A. SCAVENNEC
Abstract | PDF file (170.1 KB) - CHROMIZING-ALUMINIZING AND CHROMIZING-SILICONIZING COATING OF A FERRITIC STEEL
p. C5-681
P.A. CHOQUET, M. A. HARPER and R.A. RAPP
Abstract | PDF file (1.217 MB) - TITANIUM-BASE COATINGS ON CERAMIC OXIDE SUBSTRATES
p. C5-693
R. HILLEL, J.C. VIALA, X.L. LI and J. BOUIX
PDF file (8.581 KB) - THIN FILM OF CERAMIC OXIDES BY MODIFIED CVD
p. C5-695
J.L. DESCHANVRES, F. CELLIER, G. DELABOUGLISE, M. LABEAU, M. LANGLET and J.C. JOUBERT
Abstract | PDF file (2.437 MB) - LASER ASSISTED CVD SEMICONDUCTOR FILMS
p. C5-707
XINGWEN LI, YINGMIN WANG, YINGCAI PONG, DENGYEAN SONG and BAOTONG LI
Abstract | PDF file (18.79 KB) - PROTECTION CONTRE L'OXYDATION DE POUDRES DE FER DESTINÉES A L'ENREGISTREMENT MAGNÉTIQUE PAR DÉPÔT DE SILICIUM EN LIT FLUIDISÉ
p. C5-709
A. GALERIE, G. LE DÛ, M. CAILLET, P.A. MARI and B. PINGAUX
Abstract | PDF file (705.5 KB) - UV LIGHT-INDUCED DEPOSITION OF COPPER FILMS
p. C5-719
H. ESROM, G. WAHL and U. KOGELSCHATZ
Abstract | PDF file (2.130 MB) - NITRIDE AND CARBIDE COATINGS SYNTHESIS ON THE SURFACE OF REFRACTORY METALS BY LASER ACTION
p. C5-727
A.A. UGLOV, M.B. IGNAT'EV, A.G. GNEDOVETS and I.YU. SMUROV
Abstract | PDF file (922.5 KB) - TRENDS IN THE USE OF MOCVD TO PREPARE CERAMIC COATINGS
p. C5-737
D.M. SCHLEICH
PDF file (7.700 KB) - MOLECULAR PRECURSORS FOR HIGH Tc SUPERCONDUCTORS : ALCOXIDES AND β DIKETONATES OF Ln AND HEAVY MAIN GROUP ELEMENTS (Ba, Bi, Pb)
p. C5-738
L.G. HUBERT-PFALZGRAS
PDF file (9.166 KB) - PLASMA CVD USING ORGANOMETALLIC COMPOUNDS
p. C5-739
H. SUHR, J. BALD, L. DEUTSCHMANN, A. ETSPÜLER, E. FEURER, H. GRÜNWALD, C. HAAG, H. HOLZSCHUH, C. OEHR, S. REICH, R. SCHMID, I. TRAUS, B. WAIMER, A. WEBER and H. WENDEL
Abstract | PDF file (414.6 KB) - MOLECULAR ENGINEERING IN SEMICONDUCTOR TECHNOLOGY : BOROSILICATEGLASS BY DECOMPOSITION OF A MONOMOLECULAR PRECURSOR
p. C5-747
H. TREICHEL, O. SPINDLER and Th. KRUCK
Abstract | PDF file (334.5 KB) - PREPARATION AND CHARACTERIZATION OF Ge-Si ALLOYS CARRIED OUT BY MOCVD
p. C5-757
A. REYNES, C. DUFOR, P. MAZEROLLES and R. MORANCHO
Abstract | PDF file (667.3 KB) - EVIDENCE FOR FREE CARBON IN AMORPHOUS OMCVD SILICON-RICH SixC1-x COATINGS
p. C5-765
A. MESTARI, F. MAURY and R. MORANCHO
Abstract | PDF file (683.3 KB) - THIN SOLID FILMS OF OXIDES, TIO2, FE2O3, AND SnO2, PREPARED BY ORGANOMETALLIC
p. C5-773
WENXIU LUO and ZHONGKE TAN
Abstract | PDF file (524.4 KB) - MOCVD AND PLASMA MOCVD OF METAL OXIDE FILMS
p. C5-779
P.S. WEGLICKI, Z. CAO, N.W. SKILLEN, J.R. OWEN and P.T. MOSELEY
PDF file (11.77 KB) - THE DEVELOPMENT OF AN IMPROVED MULTILAYER CVD COATING FOR METALCUTTING APPLICATIONS
p. C5-783
K.E. UNDERCOFFER, B.K. DOWNEY, F.B. BATTAGLIA and W.A. BRYANT
Abstract | PDF file (1.324 MB) - CARACTÉRISATION DES MÉTAUX RÉFRACTAIRES DE HAUTE PURETE OBTENUS PAR CVD
p. C5-793
P. NETTER
Abstract | PDF file (364.3 KB) - A COMPARISON BETWEEN CVD AND PVD COATED CEMENTED CARBIDE CUTTING TOOLS
p. C5-803
R. PORAT and Y. CASSUTO
Abstract | PDF file (1.429 MB) - PROTECTIVE CVD COATINGS FOR THE TOOL INDUSTRY : REQUIREMENTS FOR PROCESS CONTROL AND EQUIPMENT
p. C5-811
E. MOHN, R. BONETTI and H. WIPRÄCHTIGER
Abstract | PDF file (1.421 MB)