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Issue J. Phys. Colloques
Volume 46, Number C8, Décembre 1985
Third International Conference on the Structure of Non-Crystalline Materials
Page(s) C8-617 - C8-621
DOI http://dx.doi.org/10.1051/jphyscol:1985899

Third International Conference on the Structure of Non-Crystalline Materials

J. Phys. Colloques 46 (1985) C8-617-C8-621
DOI: 10.1051/jphyscol:1985899

WHAT DIFFERENCE EXISTS IN THE STRUCTURE OF SiO2 AND GeO2 BETWEEN MELT-QUENCHED BULK GLASS AND SPUTTER-DEPOSITED AMORPHOUS FILM

K. Suzuki1, M. Misawa2 and Y. Kobayashi3

1  The Research Institute for Iron, Steel and Other Metals, Tohoku University, Katahira 2-1-1, Sendai 980, Japan
2  National Laboratory for High Energy Physics, Tsukuba, Japan
3  Nippon Mining Co., Ltd., Hitachi, Japan.


Résumé
La structure en unités tétraèdriques [SiO4]- est préservée dans les films de SiO2 obtenus par pulvérisation et dans les verres obtenus par trempe du liquide. La distribution angulaire des connexions entre trétraèdres est plus large dans les matériaux pulvérisés où il existe des pores dont le diamètre moyen est de 10 Å. Des résultats analogues sont aussi obtenus avec Ge2O amorphe.


Abstract
The [SiO4]- tetrahedral structure unit is still preserved in sputter-deposited SiO2 amorphous film as well as in melt-quenched SiO2 glass. The angle distribution for mutual connection [SiO4]-tetrahedra has a more extended fluctuation in sputter-deposited SiO2 amorphous film, which includes voids with the average size of about 10 Å in diameter. Similar behaviors have been also observed for GeO2 morphous solids.



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