Third International Conference on Hot Carriers in Semiconductors

J. Phys. Colloques 42 (1981) C7-131-C7-136
DOI: 10.1051/jphyscol:1981714

DIFFUSION OF ELECTRONS AND HOLES IN DOPED SEMICONDUCTORS AT HIGH LATTICE AND ELECTRONIC TEMPERATURES

M. Wautelet

Faculté des Sciences, Université de l'Etat, B-7000 Mons, Belgium

Résumé
Il est montré comment les propriétés de diffusion des électrons et des trous sont modifiées lorsque leur densité et la température du réseau sont élevées. En particulier, il en résulte que le transfert d'énergie des électrons au réseau dépend fortement des conditions expérimentales : le chauffage est plus efficace à basse qu'à haute puissance. La création de défauts par l'irradiation laser peut conduire à l'existence d'un état métastable de longue durée de vie près de la surface irradiée du semiconducteur.

Abstract
It is shown how the diffusion properties of electrons and holes are modified when their density and the lattice temperature are high. In particular, it arises that the transfer of energy from the electrons to the lattice depends strongly on experimental conditions : heating is more efficient at low than at high power. Laser-induced defects may result in the existence of a long-lived metastable state near the irradiated surface of the semiconductor.

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