Sommaire
Le Journal de Physique Colloques
Vol. 50 No. C5 (Mai 1989)
Actes de la 7ème Conférence Européenne sur les Dépôts Chimiques en Phase Gazeuse / Proceedings of the Seventh European Conference on Chemical Vapour Deposition
- THE APPLICATION OF INFRARED SPECTROSCOPY TO THE DETECTION OF SURFACE INTERMEDIATES IN CVD
p. C5-1
M.A. CHESTERS
PDF file (7.899 KB) - ÉTUDE PAR PHOTOÉMISSION DE L'ADSORPTION DE DISILANE SUR Si (111) 7x7
p. C5-3
M. ALAOUI, F. RINGEISEN, D. MULLER, D. BOLMONT and J.J. KOULMANN
Abstract | PDF file (314.0 KB) - SPECTROSCOPIE RAMAN COHÉRENTE DANS UN RÉACTEUR CVD
p. C5-13
N. HERLIN, M. LEFEBVRE, M. PÉALAT and M. PARLIER
PDF file (8.155 KB) - MÉTHODE D'ANALYSE DE GAZ EN AMONT ET EN AVAL DE RÉACTEURS DE MOVPE EN VUE DE LA MISE AU POINT DE PROCESS
p. C5-14
B. CROS, M. STOEHR, M. MAURIN, A. MATHIEU, J.-M. FABRE and L. GIRAL
PDF file (12.82 KB) - MONTAGE RAMAN DE HAUTES PERFORMANCES ADAPTÉ A LA CARACTÉRISATION DE LA PHASE GAZEUSE DANS DES OPÉRATIONS DE DÉPÔT CHIMIQUE EN PHASE VAPEUR. RÉSULTATS PRÉLIMINAIRES
p. C5-15
R. GAUFRES, P. HUGUET, D. BOYA and L. LAFFORET
PDF file (12.47 KB) - CONVECTION AND CHEMISTRY EFFECTS IN CVD - A 3-D ANALYSIS FOR SILICON DEPOSITION
p. C5-17
S.A. GOKOGLU, M. KUCZMARSKI, P. TSUI and A. CHAIT
Abstract | PDF file (2.331 MB) - A TWO DIMENSIONAL MODEL FOR LPCVD REACTORS HYDRODYNAMICS AND MASS TRANSFER
p. C5-35
C. VINANTE, P. DUVERNEUIL and J.P. COUDERC
Abstract | PDF file (670.7 KB) - A MATHEMATICAL MODEL OF THE SILICON CHEMICAL VAPOR DEPOSITION IN A ATMOSPHERIC PRESSURE COLD-WALL REACTOR
p. C5-45
Y.J. PARK, G.J. MIN, Y.W. PARK, C.O. PARK and J.S. CHUN
Abstract | PDF file (26.43 KB) - SIMULATION DU TRANSFERT DE CHALEUR ET DE QUANTITÉ DE MOUVEMENT DANS UN REACTEUR DE VAPODÉPOSITION
p. C5-47
H. CHEHOUANI, B. ARMAS, S. BENET and S. BRUNET
Abstract | PDF file (1.895 MB) - MODELING OF COLD WALL CHEMICAL VAPOR DEPOSITION REACTORS (FOR SEMICONDUCTOR FABRICATION)
p. C5-57
M. PONS, R. KLEIN, C. ARENA and S. MARIAUX
Abstract | PDF file (1.475 MB) - MODELING OF LPCVD SILICON NITRIDE PROCESS
p. C5-67
JI-TAO WANG, SHI-LI ZHANG, YONG-FA WANG, WEI ZHANG, ZHENG-CHANG CHEN, KE-YUN ZHANG and YUAN-FANG WANG
Abstract | PDF file (197.5 KB) - EXPERIMENTAL AND THEORETICAL DEPOSITION PROFILES FOR STATIC AND DYNAMIC PCVD WITH WF6/H2 AND/OR ORGANOMETALLIC STARTING COMPOUNDS
p. C5-73
G. GÄRTNER, P. JANIEL and F. WELING
Abstract | PDF file (735.9 KB) - PROCESS CHARACTERISATION FOR LPCVD DEPOSITION OF SiO2 FILMS FROM TEOS LIQUID SOURCE
p. C5-83
S. ROJAS, P. SERRA, W.S. WU, F. SANTARELLI, G.C. SARTI and F. MINNI
Abstract | PDF file (359.5 KB) - CVD MODIFICATION OF CERAMIC MEMBRANES : SIMULATION AND PRELIMINARY RESULTS
p. C5-91
Y.S. LIN, K.J. DE VRIES and A.J. BURGGAAF
PDF file (29.37 KB) - ON THE KINETICS OF THE CVD OF Si FROM SiH2Cl2/H2 AND SiC FROM CH3SiCl3/H2 IN A VERTICAL TUBULAR HOT-WALL REACTOR
p. C5-93
F. LANGLAIS, C. PREBENDE, B. TARRIDE and R. NASLAIN
Abstract | PDF file (434.5 KB) - THERMODYNAMIC CALCULATION OF THE TWO PHASED DEPOSITION DOMAINS WITH SiC IN THE Si-Ti-C-Cl-H CHEMICAL SYSTEM
p. C5-105
M. TOUANEN, F. TEYSSANDIER and M. DUCARROIR
Abstract | PDF file (520.9 KB) - HIGH Tc SUPERCONDUCTING THIN FILMS BY ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION
p. C5-117
B. GALLOIS
PDF file (7.742 KB) - CVD OF SUPERCONDUCTIVE YBa2 Cu3 O7-δ
p. C5-119
F. SCHMADERER and G. WAHL
Abstract | PDF file (1.737 MB) - PREPARATION OF SUPERCONDUCTING-OXIDE FILMS BY CVD AND THEIR PROPERTIES
p. C5-131
H. YAMANE, H. KUROSAWA and T. HIRAI
Abstract | PDF file (1.407 MB) - NEW TECHNIQUE FOR THE DEPOSITION OF HIGH Tc SUPERCONDUCTING FILMS
p. C5-141
M. LANGLET, E. SENET, J.L. DESCHANVRES, G. DELABOUGLISE, F. WEISS and J.C. JOUBERT
Abstract | PDF file (646.8 KB) - STUDY OF THE PREPARATION OF HIGH Tc SUPERCONDUCTING YBCO THIN FILMS BY A PLASMA-ASSISTED MOCVD PROCESS
p. C5-149
DING-KUN PENG, GUANG-YAO MENG, CHUN-BAO CAO, CHUN-LIN WANG, QI FANG, YUE-HUAN WU and YU-HENG ZHANG
Abstract | PDF file (754.2 KB) - THE BASIC LAWS OF THE CHEMICAL CRYSTALLIZATION OF DIAMOND FROM THE GAS PHASE
p. C5-157
B.V. DERJAGUIN and D.V. FEDOSEEV
PDF file (8.174 KB) - DEPOSITION OF DIAMOND LAYERS BY HOT-FILAMENT ACTIVATED CVD USING ACETONE AS A CARBON SOURCE
p. C5-159
S. OKOLI, R. HAUBNER and B. LUX
Abstract | PDF file (2.360 MB) - INFLUENCE OF THE COBALT CONTENT IN HOT-PRESSED CEMENTED CARBIDES ON THE DEPOSITION OF LOW-PRESSURE DIAMOND LAYERS
p. C5-169
R. HAUBNER and B. LUX
Abstract | PDF file (2.488 MB) - MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION OF DIAMOND
p. C5-177
L. VANDENBULCKE, P. BOU, R. HERBIN, V. CHOLET and C. BENY
Abstract | PDF file (2.458 MB) - THE CVI-PROCESSING OF CERAMIC MATRIX COMPOSITES
p. C5-191
R. NASLAIN, F. LANGLAIS and R. FEDOU
Abstract | PDF file (666.1 KB) - PREPARATION OF SIC-WHISKER REINFORCED CVD-SIC
p. C5-209
E. FITZER, W. REMMELE and G. SCHOCH
Abstract | PDF file (822.0 KB) - CVD GROWTH AND MORPHOLOGY OF Ti (C, N) WHISKERS
p. C5-219
H. SCHACHNER, G. HORLAVILLE and P. FONTAINE
Abstract | PDF file (3.398 MB) - A METHOD FOR RAPID CHEMICAL VAPOR INFILTRATION OF CERAMIC COMPOSITES
p. C5-229
T.M. BESMANN, R.A. LOWDEN, D.P. STINTON and T.L. STARR
Abstract | PDF file (1.232 MB) - AUTOCAR LAMPS COATED WITH A YELLOW MULTILAYER FILTER BY LPCVD
p. C5-241
C.A.M. MULDER, W.H.M.M. VAN DE SPIJKER, J. JENSMA, G. VERSPUI and G.H.C. HEIJNEN
Abstract | PDF file (293.2 KB) - CARACTÉRISATION ET PROPRIÉTÉS DES FIBRES DE CARBONE REVÊTUES DE CARBURES RÉFRACTAIRES DÉPOSÉS PAR CVD RÉACTIVE
p. C5-249
H. VINCENT, B. BONNETOT, J. BOUIX, H. MOURICHOUX and C. VINCENT
Abstract | PDF file (1.345 MB) - MECHANICAL RESPONSE AND RUPTURE MODES OF SiC/C CVD LAMELLAR COMPOSITES
p. C5-259
M. IGNAT, M. NADAL, C. BERNARD, M. DUCARROIR and F. TEYSSANDIER
Abstract | PDF file (1.129 MB) - MATÉRIAUX CARBONES OBTENUS PAR DÉPÔT CHIMIQUE EN PHASE VAPEUR ASSISTÉ PAR UN PLASMA RÉACTIF
p. C5-269
O. LÉVESQUE, M. RICCI, M. TRINQUECOSTE and P. DELHAÈS
Abstract | PDF file (337.8 KB) - SILICON CARBIDE CHEMICAL VAPOUR INFILTRATION
p. C5-281
Y.G. ROMAN and L.R. WOLFF
Abstract | PDF file (32.70 KB) - THE DEVELOPMENT OF AN IMPROVED MULTILAYER CVD COATING FOR METALCUTTING APPLICATIONS
p. C5-282
K.E. UNDERCOFFER, B.K. DOWNEY, F.B. BATTAGLIA and W.A. BRYANT
PDF file (10.06 KB) - ASPECTS OF ELECTRON PROBE MICROANALYSIS APPLIED TO THE CHARACTERIZATION OF COATINGS
p. C5-285
P. WILLICH and D. OBERTOP
Abstract | PDF file (439.3 KB) - COATINGS CHARACTERIZATIONS BY THE MIRAGE EFFECT AND THE PHOTOTHERMAL MICROSCOPE
p. C5-295
J.P. ROGER, D. FOURNIER, A.C. BOCCARA and F. LEPOUTRE
Abstract | PDF file (553.4 KB) - BORON CARBIDE COATINGS : CORRELATION BETWEEN MECHANICAL PROPERTIES AND LPCVD PARAMETERS VALUES
p. C5-311
J. REY, G. MALE, Ph. KAPSA and J.L. LOUBET
Abstract | PDF file (1.532 MB) - CHARACTERIZATION OF INTRINSIC STRESSES OF PECVD SILICON NITRIDE FILMS DEPOSITED IN A HOT-WALL REACTOR
p. C5-323
K. AITE, R. KOEKOEK, J. HOLLEMAN and J. MIDDELHOEK
Abstract | PDF file (281.1 KB) - AES, XPS AND TEM CHARACTERIZATION OF BORON NITRIDE DEPOSITED UNDER CHEMICAL VAPOR INFILTRATION (CVI) CONDITIONS
p. C5-333
O. DUGNE, S. PROUHET, A. GUETTE, R. NASLAIN, R. FOURMEAUX, K. HSSEIN, J. SEVELY, C. GUIMON, D. GONBEAU and G. PFISTER-GUILLOUZO
Abstract | PDF file (1.033 MB) - CARACTÉRISATION DE COUCHES MINCES DE VERRES DE CHALCOGENURE PRÉPARÉES PAR PECVD
p. C5-343
B. CROS, H. CAMON, Y. BROCHETON, J.P. GONCHOND, A. TISSIER, J.L. BALLADORE and M. RIBES
Abstract | PDF file (2.485 MB) - COMPORTEMENT PHYSICO-CHIMIQUE DE Si3N4 OBTENU PAR LPCVD SOUMIS A DES FLUX RADIATIFS INTENSES
p. C5-353
A. WANG, D. THENEGAL, C. ROYERE, C. DUPUY and B. ARMAS
Abstract | PDF file (1.816 MB) - CARACTÉRISATION DES MÉTAUX RÉFRACTAIRES DE HAUTE PURETÉ OBTENUS PAR CVD
p. C5-363
P. NETTER
PDF file (7.922 KB) - CVD OF TITANIUM CARBIDE AT MODERATE TEMPERATURE FROM TITANIUM SUBCHLORIDES
p. C5-367
B. DROUIN-LADOUCE, J.P. PITON and L. VANDENBULCKE
Abstract | PDF file (1.084 MB) - MICROSTRUCTURE OF CVD - Al2O3
p. C5-377
C. CHATFIELD, J.N. LINDSTRÖM and M.E. SJÖSTRAND
Abstract | PDF file (2.102 MB) - CVD OF YTTRIA STABILIZED ZIRCONIA
p. C5-389
J. WAHLROOS, K. TARKKELL, T.A. MANTYLA and P.O. KETTUNEN
PDF file (7.962 KB) - PHASE TRANSFORMATION DURING CVD OF ALUMINIUM OXIDE
p. C5-391
E. FREDRIKSSON and J.-O. CARLSSON
Abstract | PDF file (1.339 MB) - TITANIA-COATINGS ON STRONGLY PASSIVATED SUBSTRATES
p. C5-401
W. HAENNI, H.E. HINTERMANN, D. MOREL and A. SIMMEN
Abstract | PDF file (1.320 MB) - LTO - SiO2 DEPOSITION IN A STAGNATION FLOW LPCVD SYSTEM
p. C5-411
R. WEBER, G. WAHL and R. HUBER
Abstract | PDF file (1.066 MB) - HARDNESS AND DIMENSIONS OF STEELS WITH HARD COATINGS PRODUCED BY CHEMICAL VAPOUR DEPOSITION AT MEDIUM TEMPERATURES
p. C5-421
W. RUPPERT
Abstract | PDF file (41.13 KB) - A COMPARISON BETWEEN CVD AND PVD COATED CEMENTED CARBIDE CUTTING TOOLS
p. C5-422
R. PORAT and Y. CASSUTO
PDF file (7.528 KB) - LOW PRESSURE CHEMICAL VAPOR DEPOSITION (CVD) ON OXIDE AND NONOXIDE CERAMIC CUTTING TOOLS
p. C5-423
A. LAYYOUS and R. WERTHEIM
Abstract | PDF file (1.329 MB) - PROTECTIVE CVD COATINGS FOR THE TOOL INDUSTRY : REQUIREMENTS FOR PROCESS CONTROL AND EQUIPMENT
p. C5-433
E. MOHN, R. BONETTI and H. WIPRÄCHTIGER
PDF file (8.755 KB) - MORPHOLOGICAL ASPECTS OF SILICON CARBIDE CHEMICALLY VAPOR-DEPOSITED ON GRAPHITE
p. C5-434
A. PARRETTA, A. CAMANZI, G. GIUNTA, V. ADONCECCHI, P. ALESSANDRINI and A. MAZZARANO
Abstract | PDF file (24.51 KB) - KINETICS OF THE CHEMICAL VAPOR DEPOSITION OF SILICON NITRIDE-FROM Si(CH3)4/ NH3/H2 GAS MIXTURES
p. C5-435
N. ROELS, T. LECOINTE, R. GUINEBRETIERE and J. DESMAISON
Abstract | PDF file (554.1 KB) - TITANIUM CARBIDE COATINGS ON STEEL : STUDY OF THE CONDITIONS OF ELABORATION AND OF SUBSTRATE-COATING INTERACTIONS
p. C5-445
A. DERRE, F. TEYSSANDIER and M. DUCARROIR
Abstract | PDF file (1.487 MB) - ÉTUDE, PAR LA MÉTHODE DES RADIOTRACEURS, DE LA DIFFUSION DU FER DANS LE SILICIURE DE FER Fe3Si OBTENU PAR CVD
p. C5-455
S. AUDISIO and P. GUIRALDENQ
Abstract | PDF file (517.8 KB) - LPCVD SILICON FOR ACTIVE DEVICES
p. C5-467
B. LOISEL, L. HAJI and M. GUENDOUZ
Abstract | PDF file (2.398 MB) - CHEMICAL VAPOR DEPOSITION OF REFRACTORY METALS DISILICIDES : A REVIEW
p. C5-479
R. MADAR and C. BERNARD
Abstract | PDF file (1.527 MB) - HETEROEPITAXY OF COVALENT SEMICONDUCTORS : FUNDAMENTALS, GROWTH AND CRYSTAL PROPERTIES
p. C5-499
A. FREUNDLICH
Abstract | PDF file (2.253 MB) - EPITAXIAL SILICON GROWTH IN A REDUCED PRESSURE AND TEMPERATURE CVD REACTOR
p. C5-519
J. L. REGOLINI, D. BENSAHEL, J. MERCIER and E. SCHEID
Abstract | PDF file (311.5 KB) - GROWTH ANISOTROPY AND REACTIONS MECHANISMS IN METAL ORGANICS VAPOR PHASE
EPITAXY OF GaAs
p. C5-529
P. GIBART, A. TROMSON-CARLI, Y. MONTEIL and A. RUDRA
Abstract | PDF file (2.282 MB) - GROWTH CONDITION ANALYSIS AND CHARACTERIZATION OF HIGH PERFECTION InGaAs/InP LAYERS GROWN BY HYDRIDE VPE
p. C5-539
G. ATTOLINI, C. BOCCHI, C. FRIGERI and C. PELOSI
Abstract | PDF file (2.586 MB) - ÉTUDE THERMODYNAMIQUE DU PROCESSUS DE DÉPÔT PAR LA TECHNIQUE DU "MUR CHAUD" - APPLICATION AUX SYSTÈMES Pb-Te, Pb-Se, Pb-Se-Te
p. C5-549
M. MULLER, B. LIAUTARD, R. ASTIER, G. BRUN and J.C. TEDENAC
Abstract | PDF file (841.9 KB)